Description
The task of identifying nanoscale defects is a very time-consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput. In addition, Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry's lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.

Feature

• Dual Servo System

• High Speed Z Scanner

• 2D Flexure-Guided Scanner

• Low Noise XYZ Position Sensor

• Automatic Measurement Control

• Fully Automated Pattern Recognition

 
Application

Automatic Defect Review for Substrates & Media
The Automatic Defect Review (Park ADR) in the NX-HDM speeds up and improves the way defects in substrates and media are identified, scanned, and analyzed. Using the defect location map provided from an optical inspection tool, Park ADR automatically goes to each of those locations, and images the defects in two steps:
(1) image a larger, survey scan to refine the defect location,
(2) then image a smaller zoom-in scan to obtain the details of the defect.
Test runs with real defects demonstrate a 10x increase in throughput for defect review in an automated process compared to conventional methods.